The Export of Goods (Control) Order 1991

IL1710

Fluids and lubricating materials, the following–

• (a) Hydraulic fluids which contain any of the following compounds or materials as their principal ingredients:

• (1) Highly refined super-dewaxed petroleum (mineral) oils, synthetic hydrocarbon oils or silahydrocarbon oils, having all of the following characteristics–

• (A) Flash point exceeding 477K (204°C);

• (B) Pour point 239K (−34°C) or lower;

• (C) Viscosity index 75 or more; and

• (D) Thermal stability 616K (343°C); (Silahydrocarbon oils are those oils which contain exclusively silicon, hydrogen and carbon.) (2) Chlorofluorocarbons having all of the following characteristics–

• (A) No flash point;

• (B) Autogenous ignition temperature exceeding 977K (704°C);

• (C) Pour point 219K (−54°C) or lower;

• (D) Viscosity index 80 or more; and

• (E) Boiling point 473K (200°C) or higher;

• (chlorofluorocarbons are those chemicals which contain exclusively carbon, fluorine and chlorine); or

• (3) Monomeric or polymeric forms of perfluoropolyalkylether-triazines or perfluoroaliphatic ethers

• (b) Lubricating materials containing any of the following compounds or materials as their principal ingredients–

• (1) Monomeric or polymeric forms of perfluoropolyalkylether-triazines or perfluoroaliphatic ethers

• (2) Phenylene or alkylphenylene ethers or thio-ethers, or their mixtures, containing more than two ether or thio-ether functions or mixtures thereof

• (3) Polychlorotrifluoroethylene (oily and waxy modifications only)

• or

• (4) Fluorinated silicone fluids with kinematic viscosity of less than 5,000mm² /s (5,000 centistokes) measured at 298K (25°C)

• (c) Damping or flotation fluids made of at least 85% of any of the following compounds or materials–

• (1) Dibromotetrafluoroethane having a purity exceeding 99.8% and containing less than 25 particles of 200 micrometre or larger in size per 100ml

• (2) Polychlorotrifluoroethylene (oily and waxy modifications only)

• or

• (3) Polybromotrifluoroethylene

• (d) Cooling fluids made of at least 85% of any of the following compounds or materials–

• (1) Monomeric or polymeric forms of perfluoropolyalkylether-triazines or perfluoroaliphatic ethers

• (2) Perfluoroalkylamines

• or

• (3) Perfluorocycloalkanes or perfluoroalkanes with all of the following characteristics–

• (A) Density at 298K (25°C) of 1.5g/ml or more;

• (B) In a liquid state at 273K (0°C); and

• (C) Containing 60% or more by weight of fluorine.

In this entry–

• (a) Flash point is determined using the Cleveland Open Cup Method described in ASTM D-92 or national equivalents;

• (b) Pour point is determined using the method described in ASTM D-97 or national equivalents;

• (c) Viscosity index is determined using the method described in ASTM D-2270 or national equivalents;

• (d) Thermal stability is determined by the following test procedure or national equivalents: Twenty ml of the fluid under test is placed in a 46ml type 317 stainless steel chamber containing one each of 12.5mm (nominal) diameter balls of M-10 tool steel, 52100 steel and naval bronze (60% Cu, 39% Zn, 0.75% Sn). The chamber is purged with nitrogen, sealed at atmospheric pressure and the temperature raised to and maintained at 644 + 6K (371 + 6°C) for six hours. The specimen will be considered thermally stable if, on completion of the above procedure, all of the following conditions are met:

• (1) The loss in weight of each ball is less than 10mg/mm² of ball surface;

• (2) The change in original viscosity as determined at 311K (38°C) is less than 25%; and

• (3) The total acid or base number is less than 0.40;

• (e) Autogenous ignition temperature is determined using the method described in ASTM E-659 or national equivalents.

IL1715

Boron, the following–

• (a) Boron element (metal) in all forms

• (b) Boron compounds, mixtures, and composites containing 5% or more of boron (except pharmaceutical preparations packaged for retail sale), the following–

• (1) non-ceramic boron-nitrogen compounds (eg borazanes, borazines and boropyrazoyls)

• (2) boron hydrides (eg boranes), except sodium boron hydride, potassium boron hydride, monoborane, diborane and triborane

• (3) organoboron compounds, including metallo-organoboron compounds

PL7006

Boron compounds and mixtures in which the boron-10 isotope comprises more than 20% of the total boron content

IL1733

Base materials, non-composite ceramic materials, ceramic-ceramic composite materials and precursor materials for the manufacture of high temperature fine technical ceramic products, the following–

• (a) Base materials having all the following characteristics–

• (1) any of the following compositions–

• (i) single or complex oxides of zirconium, and complex oxides of silicon or aluminium;

• (ii) single or complex borides of zirconium or titanium;

• (iii) single or complex carbides of silicon or boron; or

• (iv) single or complex nitrides of silicon, boron, aluminium or zirconium;

• (2) total metallic impurities, excluding intentional additions, of less than–

• (i) 1,000ppm for single oxides or carbides;

• (ii) 5,000ppm for complex compounds, single borides or single nitrides; and

• (3) average particle size less than or equal to 5 micrometres and no more than 10% of the particles larger than 10 micrometres except for zirconia where these limits are 1 micrometre and 5 micrometres respectively.

• (b) Non-composite ceramic materials, in crude or semi-fabricated form, composed of any material specified in head (a) above, except abrasives

• (c) Ceramic-ceramic composite materials containing finely dispersed particles or phases or any non-metallic fibrous or whisker-like materials, whether externally introduced or grown in situ

during processing, where the following materials form the host matrix–

• (1) all oxides, including glasses

• (2) carbides or nitrides of silicon or boron

• (3) borides or nitrides of zirconium or borides, carbides or nitrides of hafnium

• (4) any combination of the materials specified in sub-heads (c)(1) to (3) above

except–

manufactured products or components not specified elsewhere in this Schedule.

• (d) Precursor materials, (ie. special-purpose polymeric or metallo-organic materials for producing any base or phases of the materials specified inhead (b) or (c) above), the following–

• (1) polycabosilanes and polydiorganosilanes (for producing silicon carbide) A

• (2) polysilazanes (for producing silicon nitride) A

• (3) polycarbosilazanes for producing ceramics with silicon, carbon and nitrogen components

In this entry–

• (a) a “matrix” means a substantially continuous phase that fills the space between particles, whiskers or fibres;

• (b) a “composite” means a matrix and an additional phase or additional phases consisting of particles, whiskers, fibres or any combination thereof, present for a specific purpose or purposes.

IL1746

Non-fluorinated polymeric substances, the following:

• (a) Polyimides (including maleimides)

• except–

• fully cured polyimide or polyimide-based film, sheet, tape or ribbon having a maximum thickness of 0.254mm, whether or not coated or laminated with heator pressure-sensitive resinous substances of an adhesive nature, which contain no fibrous reinforcing materials, and which have not been coated or laminated with carbon, graphite, metals or magnetic substances.

• (b) Polybenzimidazoles

• (c) Aromatic polyamides, including heterocyclic aromatic polyamides characterised as aromatic owing to the presence of a benzene ring

• (d) Polybenzothiazoles

• (e) Polyoxadiazoles

• (f) Polyphosphazenes (polyphosphonitriles)

• (g) Polystyrylpyridine (PSP)

• (h) Thermoplastic liquid crystal copolymer composed of the following–

• (1) Either of the following–

• (A) Phenylene, biphenylene or naphthalene; or

• (B) Methyl, tertiary-butyl or phenyl substituted phenylene, biphenylene or naphthalene; and

• (2) Any of the following acids–

• (A) Terephthalic acid;

• (B) 6-hydroxy-2 naphthoic acid; or

• (C) 4-hydroxybenzoic acid;

• except–

• manufactures thereof, having both of the following characteristics–

  • (A) A tensile modulus of less than 15GPa in any direction; and

  • (B) Specially designed for non-aerospace, non-electronic, civil applications;

• (i) Polybenzoxazoles

• (j) Polyarylene ether ketones, the following–

• (1) Polyether ether ketone (PEEK)

• (2) Polyether ketone ketone (PEKK)

• (3) Polyether ketone (PEK)

• (4) Polyether ketone ether ketone ketone (PEKEKK)

• (k) Butadiene polymers, the following–

• (1) Carboxyl terminated polybutadiene (CTPB)

• (2) Hydroxyl terminated polybutadiene (HTPB)

• (3) Thiol terminated polybutadiene (TTPB)

• (4) Vinyl terminated polybutadiene (VTPB)

• (5) Cyclised 1,2-polybutadiene

• (6) Mouldable copolymers of butadiene and acrylic acid

• (7) Mouldable terpolymers of butadiene, acrylonitrile and acrylic acid or any of the homologues of acrylic acid

• (l) Carboxyl terminated polyisoprene

• (m) Polyarylene ketones

• (n) Polyarylene sulphides, except polyphenylene sulphide

PL7028

Propellants for spacecraft, and related substances, the following: and specially designed software therefor–

• (a) propellants specially designed for goods specified in IL1465

• (b) additives, precursors and stabilisers, for any material specified in head (a) above

IL1754

Fluorinated compounds and materials, and manufactures thereof, the following–

• (a) Unprocessed polymeric materials and intermediates, the following–

• (1) Fluoroelastomeric compounds where the polymer backbone consists of at least 95% of–

• (A) A combination of two or more of the following monomers–

• (a) Tetrafluoroethylene;

• (b) Vinylidene fluoride;

• (c) Hexafluoropropylene;

• (d) Bromotrifluoroethylene;

• (e) Iodotrifluoroethylene;

• (f) Perfluoromethylvinylether;

• (g) Perfluoropropoxypropylvinylether;

• except–

• the copolymer of vinylidene fluoride and hexafluoropropylene, or the terpolymer of vinylidene fluoride, hexafluoropropylene and tetrafluoroethylene;

• (B) A copolymer of tetrafluoroethylene and propylene; or

• (C) A terpolymer of tetrafluoroethylene, vinylidene fluoride and propylene

• (2) Copolymers of vinylidene fluoride having 75% or more beta crystalline structure without stretching

• (3) Fluorinated silicone rubbers, and intermediates for their production, containing 30% or more of combined fluorine

• (4) Fluorinated polyimides, and hexafluoroacetone and other intermediates for their production, containing 30% or more of combined fluorine

• (5) Fluorinated phosphazene elastomers, and intermediates for their production, containing 30% or more of combined fluorine

• (b) Manufactures, the following–

• (1) Electric wire and cable coated with or insulated with any of the materials specified in sub-head (a)(1)(B) or (a)(1)(C) above

except–

oil well logging cable;

• (2) Seals, gaskets, rods, sheets, sealants or fuel bladders made, to the extent of more than 50%, of any of the compounds specified in sub-head (a)(1), (a)(3), (a)(4) or (a)(5) above, and specially designed for aerospace or aircraft use

• (3) Piezoelectric polymers and copolymers made from vinylidene fluoride, having both of the following characteristics

• (A) In sheet or film form; and

• (B) With a thickness of more than 200 micrometre.

• (4) Reinforced tubing (including connectors and fittings for use with such tubing) incorporating coagulated dispersion grades of polytetrafluoroethylene, copolymers of tetrafluoroethylene and hexafluoropropylene, or any of the fluorocarbon compounds specified in sub-head (a)(1) above and designed for operating (working) pressures of 21 MPa or more, whether or not specially processed to make the flow surfaces electrically conductive

IL1757

Compounds and materials, the following–

• (a) Monocrystalline silicon in the form of ingots (rods), and slices or wafers thereof, having a resistivity of more than 1000 ohm-cm

• (b) Gallium of a purity equal to or more than 99.9999% and gallium III/V compounds of any purity level

• except–

• (1) Gallium phosphide; or

• (2) Other gallium III/V compounds having all of the following characteristics–

• (A) Dislocation density (etch pit density–EPD) exceeding 100 per mm² ;

• (B) Carrier concentration exceeding 1 × 10¹⁴ per mm³ ; and

• (3) Carrier mobility less than 0.3 m² /V-s;

• (c) Indium of a purity more than 99.9995% and III-V indium compounds containing more than 1% indium

• (d) Hetero-epitaxial materials consisting of a monocrystalline insulating substrate epitaxially layered with silicon, III/V compounds of gallium or indium or II/VI compounds of sulphur, selenium or tellurium

• (e) Elemental Cadmium (Cd) and Tellerium (Te) of purity levels equal to or more than 99.9995% and cadmium terullide (CdTe) compounds of a purity level equal to or more than 99.99% or single crystals of cadmium terullide (CdTe) of any purity level

• (f) Rods of polycrystalline silicon having either of the following characteristics–

• (1) Boron impurity concentration (P-type) equal to or less than 0.052 parts per thousand million atomic

• or

• (2) P-type resistivity equal to or more than 5,000 ohm-cm

• (g) Compounds having a purity level (based upon the amount of the primary constituent) of 99.5% or more and used as the silicon source in the deposition of epitaxial layers of silicon, silicon oxide or silicon nitride, and dichlorosilane (SiC1₂H₂) having a purity level of 97% or more

• (h) Single crystal sapphire substrates

• (i) Boron oxide (B² 0³ ) in powder or cast form with a purity of 99.9% or more, containing 1,000 or less parts per million of water

• (j) Resist materials, the following–

• (1) Negative type resists, optimised for photolithography at a wavelength of less than 350 nm

• (2) Positive type resists optimised for photolithography at a wavelength of less than 370 nm

• except–

• positive type resists not optimised for a specific wavelength

• (3) All resists for use with electron beams or ion beams with a sensitivity of 50 microcoulomb/cm² or less

• (4) All resists for use with X-rays with a sensitivity of 50 mJ/cm² or less

• (5) All resists optimised for surface imaging technologies, including silyated resists

• (6) Image reversal resists

• (k) Monocrystalline lithium niobate

• (l) Metallo-organic compounds of beryllium, magnesium, zinc, cadmium, mercury, aluminium, gallium, indium, phosphorus, arsenic or antimony having a purity (metal basis) of 99.999% or more

• (m) Hydrides of phosphorus, arsenic, antimony, selenium or tellurium having a purity of 99.999% or more, even diluted in neutral gases

• except–

• those with the addition of 20% molar or more of rare gases or hydrogen.

• Notes:

• 1. Silyation techniques are processes incorporating oxidation of the resist surface to enhance performance for both wet and dry developing.

• 2. III/V compounds are polycrystalline or binary or complex monocrystalline products consisting of elements of groups IIIA and VA of Mendeleyev’s periodic classification table (gallium arsenide, gallium-aluminium arsenide, indium phosphide, etc.).

• 3. II/VI compounds are polycrystalline or binary or complex monocrystalline products consisting of elements of groups IIB and VIA of Mendeleyev’s periodic classification table (cadmium telluride, cadmium-mercury telluride, cadmium-zinc telluride, etc.).

PL7034

Graphites, the following:

• (a) fine grain recrystallised bulk graphites having a bulk density of 1.72g/cc or greater, measured at 15°C

• (b) pyrolytic reinforced graphites

• (c) fibrous reinforced graphites

IL1759

Syntactic foam for underwater use and microspheres, the following–

• (a) Syntactic foam having either of the following characteristics–

• (1) designed for marine depths exceeding 1,000 m

• (2) a density less than 0.561 g/cm³ unless designed for use at marine depths less than 100 m

• (b) Hollow microspheres (microballoons) for use in syntactic foam, having all of the following characteristics–

• (1) made from glass or plastic;

• (2) a true particle density of more than 0.16 g/cm³ and less than 0.41 g/cm³ ;

• (3) a bulk density of more than 0.088 g/cm³ and less than 0.23 g/cm³ ;

• (4) a compressive strength more than 2.8 MPa;

• (5) a particle size range of 20 to 200 micrometre; and

• (6) a floater content of at least 94 per cent by volume.

In this entry–

“syntactic foam” means hollow spheres of plastic or glass embedded in a resin matrix.

IL1763

Fibrous and filamentary materials which may be used in organic matrix, metallic matrix or carbon matrix composite structures or laminates, and such composite structures and laminates and technology therefor, the following: and specially designed ODMA software therefor–

• (a) Fibrous and filamentary materials with specific modulus greater than3.18 × 10⁶ m and specific tensile strength greater than 7.62 × 10⁴ m

• (b) Fibrous and filamentary materials having both of the following characteristics–

• (1) specific modulus greater than 2.54 × 10⁶ m; and

• (2) melting or sublimation point higher than 1,922 K (1,649°C) in an inert environment

• except–

• (A) carbon fibres having a specific modulus less than 5.08 × 10⁶ m and a specific tensile strength less than 2.54 × 10⁴ m;

• (B) discontinuous, multiphase, polycrystalline alumina fibres in chopped fibre or random mat form, containing 3% by weight or more silica, having a specific modulus less than 10 × 10⁶ m;

• (C) molybdenum and molybdenum alloy fibres;

• (D) discontinuous ceramic fibres having their melting point or sublimation point lower than 2,043K (1,770°C) in an inert environment;

• (c) Resin or pitch-impregnated fibres (prepregs), metal or carbon-coated fibres (preforms) or carbon fibre preforms made with materials specified in head (a) or (b) above

• (d) Composite structures, laminates and manufactures thereof for products and components made either with an organic matrix, a carbon matrix or a metal matrix utilising materials specified in head (a), (b) or (c) above

• except–

• manufactured products or composites not specified elsewhere in this Schedule.

• (e) Technology for fibrous and filamentary materials and for composite structures and laminates, the following–

• (1) technology which is unique to the spinning and subsequent treatment of precursor materials into fibres specially designed for processing into carbon filamentary materials specified in head (a) or (b) above

• (2) technology for the production of fibrous and filamentary materials specified in head (a) or (b) above

• (3) technology for the production of prepregs specified in head (c) above using pressure impregnation or chemical vapour deposition, and for preforms specified in head (c) above using vacuum or pressure impregnation of chemical vapour deposition

• (4) technology for the development and production of composite structures, laminates and manufactures specified in head (d) above

• (5) technology for rigidisation and densification processes specially designed for the manufacture of carbon-carbon composite materials, the following–

• (i) for impregnation, infiltration or deposition into carbon fibre preforms

• (ii) for carbonisation

• (iii) for graphitisation

• (iv) for hot isostatic pressing

In this entry–

• 1. the term “fibrous and filamentary materials” includes:

  • (a) continuous monofilaments;

  • (b) continuous yarns and rovings;

  • (c) tapes, fabrics, random mats and braids;

  • (d) chopped fibres, staple fibres and coherent fibre blankets;

  • (e) whiskers, either monocrystalline or polycrystalline, of any length;

• 2. “specific modulus” is Young’s modulus in pascals, equivalent to N/m² divided by specific weight in N/m³ measured at a temperature of (296 ± 2) K ((23 ± 2)°C) and a relative humidity of (50 ± 5)%;

• 3. “specific tensile” strength is ultimate tensile strength in pascals, equivalent to N/m² divided by specific weight in N/m³ measured at a temperature of (296 ± 2) K (23 ± 2)°C) and a relative humidity of (50 ± 5)%;

• 4. “carbon fibre preform” means an ordered arrangement of uncoated or coated fibres intended to constitute a framework of a part before the matrix is introduced to form a composite;

• 5. “matrix” means a substantially continuous phase that fills the space between particles, whiskers or fibres;

• 6. “composite” means a matrix and an additional phase or additional phases consisting of particles, whiskers, fibres or any combination thereof, present for a specific purpose or purposes.

PL7046

Resaturated pyrolized (ie carbon-carbon) materials designed for use in goods specified in entry IL1465 or ML4

IL1767

Preforms of glass or of any other material specially designed for the fabrication of optical fibres specified in head (b) or (c) in entry IL1526 in Group 3F relating to cable and wire

In this entry “optical fibre preforms” means bars, ingots, or rods of glass, plastic or other materials which have been specially processed for use in fabricating optical fibres.

PL7007

Chemicals, the following–

• (a) Ammonium hydrogen fluoride

• (b) Arsenic trichloride

• (c) Benzilic acid

• (d) 2-chloroethanol

• (e) Diethylaminoethanol

• (f) Diethyl ethylphosphonate

• (g) Diethyl methylphosphonite

• (h) Diethyl-N, N-dimethylphosphoramidate

• (i) Diethyl phosphite

• (j) Di-isopropylamine

• (k) Dimethylamine

• (l) Dimethylamine hydrochloride

• (m) Dimethyl ethylphosphonate

• (n) Dimethyl methylphosphonate

• (o) Dimethylphosphite

• (p) Ethyl phosphinyl dichloride

• (q) Ethyl phosphinyl difluoride

• (r) Ethyl phosphonyl dichloride

• (s) Ethyl phosphonyl difluoride

• (t) 3-hydroxy-1-methylpiperidine

• (u) Hydrogen fluoride

• (v) Methyl benzilate

• (w) Methyl phosphinyl dichloride

• (x) Methyl phosphinyl difluoride

• (y) Methyl phosphonyl dichloride

• (z) Methyl phosphonyl difluoride

• (aa) N,N-diisopropyl-(Beta)-aminoethane thiol

• (bb) N,N-diisopropyl-(Beta)-amino ethanol

• (cc) N,N-diisopropyl-(Beta)-aminoethyl chloride

• (dd) O-ethyl-2-di-isopropylaminoethyl methylphosphonite

• (ee) Pinacolone

• (ff) Pinacolyl alcohol

• (gg) Phosphorus oxychloride

• (hh) Phosphorus pentachloride

• (ii) Phosphorus pentasulphide

• (jj) Phosphorus trichloride

• (kk) Potassium bifluoride

• (ll) Potassium cyanide

• (mm) Potassium fluoride

• (nn) 3-quinuclidinol

• (oo) 3-quinuclidone

• (pp) Sodium bifluoride

• (qq) Sodium cyanide

• (rr) Sodium fluoride

• (ss) Sodium sulphide

• (tt) Thiodiglycol

• (uu) Thionyl chloride

• (vv) Tri-ethanolamine

• (ww) Triethyl phosphite

• (xx) Trimethyl phosphite